100 kV Electron Beam Lithography System
Agency: | DEPT OF DEFENSE |
---|---|
Level of Government: | Federal |
Category: |
|
Opps ID: | NBD00159513256114320 |
Posted Date: | Feb 22, 2023 |
Due Date: | Mar 10, 2023 |
Solicitation No: | N00173-23-RFI-ML01 |
Source: | https://sam.gov/opp/cd5a07b893... |
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- Contract Opportunity Type: Sources Sought (Original)
- All Dates/Times are: (UTC-05:00) EASTERN STANDARD TIME, NEW YORK, USA
- Original Published Date: Feb 22, 2023 10:58 am EST
- Original Response Date: Mar 10, 2023 06:00 pm EST
- Inactive Policy: 15 days after response date
- Original Inactive Date:
-
Initiative:
- None
- Original Set Aside:
- Product Service Code: 6640 - LABORATORY EQUIPMENT AND SUPPLIES
-
NAICS Code:
- 334516 - Analytical Laboratory Instrument Manufacturing
-
Place of Performance:
Washington , DC 20375USA
Title: 100 kV Electron Beam Lithography System
OBJECTIVE
The Naval Research Laboratory (NRL) is searching for potential sources that are capable of meeting the requirements described in the attached draft specifications. The specifications describe the minimum technical requirements and the minimum acceptable performance standards for a 100 kV Electron Beam Lithography (EBL) system to be installed by the contractor at the Naval Research Laboratory (NRL), Washington, DC. The 100 kV EBL system will be placed in a multi-user class 100 cleanroom facility and must provide ease of operation and safety to those in the facility. The salient characteristics are intended to be descriptive in nature for the types of items that would meet NRL's minimum requirements, and not limit to any particular manufacturer. NRL is specifically interested in identifying additional items and sources that can meet the general specifications.
CONTRACTOR RESPONSE FORMAT
The NRL asks that interested parties, at a minimum, supply the following information:
Contact/Business Information
a) Name of Company
b) Point of Contact (POC)
c) Business Size/Socioeconomic Categories and number of employees
Technical Information
a) Description/information of items that can meet the attached draft specifications
b) Describe whether your company can provide 100 kV Electron Beam Lithography (EBL) system with 200MHz Pattern Generator that patterns rectangles, triangles, quadrangles, in x/y matrix and circles in a radial direction, or a comparable product that meets attached draft specifications
c) Describe whether your company can provide a 200Mhz pattern generator which offers ease of use for both experienced and novice users while simultaneously completing patterning quickly
d) Prior experience of similar scope in the attached draft specifications
e) Does your firm consider this requirement to be a commercial (as defined in FAR 2.101) or noncommercial item/service?
f) Any questions/suggestions (including alternate configurations) related to the draft specifications
g) Suggested NAICS and PSC for the effort
Responses should be no more than 10 pages, and should be emailed to the Contract Specialist at morgan.lynch@nrl.navy.mil.
NOTE: THIS IS NOT A SOLICITATION. This is a sources sought notice for information and planning purposes only, and is not to be construed as a commitment by the Government, nor will the Government pay for information solicited. No evaluation letters and/or results will be issued to the respondents. The Government is not committed to awarding a contract or issuing a solicitation pursuant to this announcement. No solicitation package is available at this time.
- 4555 OVERLOOK AVE SW
- WASHINGTON , DC 20375-5328
- USA
- MORGAN LYNCH
- MORGAN.LYNCH@NRL.NAVY.MIL
- Heather Dinsmore
- Heather.Dinsmore@nrl.navy.mil
- Feb 22, 2023 10:58 am ESTSources Sought (Original)
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